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New star interprets the development characteristics of vacuum titanium plating technology
1、 Development and application of PVD (titanium plating) technology
PVD(物理气相沉积)技术在二十世纪七十年代末，开端应用在提高机械力学性能的硬质膜方面，制备的薄膜 具有高硬度、低摩擦系数、很好的耐磨性和化学稳定性等优点。最初在高速钢刀具范畴的成功应用引起了世 界各国工具制造业的高度重视，人们在开发高性能、高牢靠性涂层设备的同时，也在硬质合金、**类刀具中 停止了更加深入的涂层应用研究。PVD工艺对环境无不利影响，契合现代绿色制造的开展方向。
镀钛工艺处置温度可控制在150～500℃以下，因此镀钛工艺可用于多种材质基体的涂层，不仅具有多姿多彩 的装饰效果，更重要的是采用PVD技术可使涂层具有优异的理化特性，大幅度强化基体表面诸如硬度、摩擦 系数等物理特性指标。
二、离子真空镀膜技术的特点和用途
真空离子镀钛应用的就是PVD技术。
金属在特定环境下(压力，温度，电磁场等)与各种气体(氩气，氮气，氧气及乙炔气等)发生综协作用形成等 离子体，经过减速后，等离子体涌向被镀工件表面，形成结实的膜层。该镀钛膜层细密平均，结合力强，硬 度高，防腐耐磨，具有良好的导电性和自光滑性能，同时色泽丰厚多样，因此真空镀钛不仅是提高材料使用 性能的有力手段，在装饰上同样是提升层次，提高附加值的最佳选择。
This article is from:http://www.newstar-china.com/
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